Institute of Plasma Research

The physics of plasmas covers a wide field of fundamental and applied research topics. Plasma physics is the basis to understand the birth of galaxies, the processes in the sun and the ionosphere, the generation of arcs and lightning. But plasmas are also an important element in the production of high-technology such as low-energy-consumption lamps, plasma displays, bio-compatible materials or microchips. Plasma is used for sterilisation and to create nano-layers on material surfaces. Plasma is needed for future technologies like plasma thrusters or nuclear fusion reactors, which are an important option for future energy production.

The scientific contributions of IPF cover the wide range from fusion oriented high-temperature plasma physics to industrial applications of low-temperature plasmas. Fusion related research is carried out in co-operation with Max-Planck-Institut für Plasmaphysik in Garching and Greifwald and with Karlsruhe Institute of Technology (KIT). The work reaches from fundamental investigations of plasma dynamical processes to plasma heating with high-power microwaves. 

The low temperature plasma technological activities of IPF are supported by German government, the European Union, and industry. They concentrate on the application of microwave powered plasma sources for deposition of barrier layers, e.g., for photo-voltaic devices, for fuel cell membranes, and for sterilised food packaging as well as on the generation of atmospheric plasmas for surface treatment and for waste gas treatment. The synergy between the know-how on microwave technology and plasma physics fosters the development of innovative plasma sources for specialised applications.

Microwave technology:

Development of high power microwave systems (frequency range: 2.45 to 140 GHz; power range: kW to MW, pulsed or CW) for magnetically confined fusion plasmas (stellarators, tokamaks, e.g., W7-X, ASDEX Upgrade,
ITER). Application for plasma formation and heating, investigation of confinement properties of fusion plasmas using microwave heating.

Plasma dynamics and diagnostics:

Investigations of dynamic plasma processes, electromagnetic plasma waves and turbulence in magnetized plasmas. Experiments on stellarators and tokamaks, operation of torsatron TJ-K, computer simulations of waves and turbulence. Development of multi-probe-array and laser-induced-fluorescence diagnostics. Experiments and particle-in-cell simulations of the plasma sheath and solitons including negative ions.

Plasma technology:

Development of plasma processing techniques, particularly for surface treatment and thin film deposition. Plasma generation at atmospheric and low pressure using RF and microwave excitation.
Combined application of microwaves and magnetic fields (ECRH). Basic and applied research on plasmasterilisation, relying on new inactivation mechanisms such as formation of radicals, ion bombardment and vacuum-UV radiation, and on plasma enhanced deposition of barrier layers for packaging materials, thin film solar cells and fuelcells, treatment of technical textiles, and plasma polymerisation.
Development of methods for in situ plasma characterisation, process control and thin film growth. Characterisation of thin films by infrared absorption spectroscopy, and optical emission spectroscopy in the infrared and visible spectral range.

Equipment:

• Several RF devices at 2.45 GHz/6 kW, 915 MHz/20 kW, 8 GHz/2 kW and 14 GHz/2 kW. RF linear amplifier 0.01-220 MHz/1 kW.
• Various plasma reactors with and without magnetic field structures for large area RF and microwave plasma generation.
• Infrared Fourier spectrometer, infrared, visible and UV spectrometer, SEM with EDX, permeation measurement devices and Langmuir probes. 6 MW high current power supply.
• Numerous diagnostic apparatus with local data processing, connections to main frame computer.